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Particle deposition is the spontaneous attachment of particles to surfaces. The particles in question are normally colloidal particles, while the surfaces involved may be planar, curved, or may represent particles much larger in size than the depositing ones (e.g., sand grains). Deposition processes may be triggered by appropriate hydrodynamic flow conditions and favorable particle-surface interactions. Depositing particles may just form a monolayer which further inhibits additional particle deposition, and thereby one refers to ''surface blocking''. Initially attached particles may also serve as seeds for further particle deposition, which leads to the formation of thicker particle deposits, and this process is termed as ''surface ripening'' or ''fouling''. While deposition processes are normally irreversible, initially deposited particles may also detach. The latter process is known as ''particle release'' and is often triggered by the addition of appropriate chemicals or a modification in flow conditions. Microorganisms may deposit to surfaces in a similar fashion as colloidal particles. When macromolecules, such as proteins, polymers or polyelectrolytes attach to surfaces, one rather calls this process adsorption. While adsorption of macromolecules largely resembles particle deposition, macromolecules may substantially deform during adsorption. The present article mainly deals with particle deposition from liquids, but similar process occurs when aerosols or dust deposit from the gas phase. ==Initial Stages== A particle may diffuse to a surface in quiescent conditions, but this process is inefficient as a thick depletion layer develops, which leads to a progressive slowing down of the deposition. When particle deposition is efficient, it proceeds almost exclusively in a system under flow. In such conditions, the hydrodynamic flow will transport the particles close to the surface. Once a particle is situated close to the surface, it will attach spontaneously, when the particle-surface interactions are attractive. In this situation, one refers to ''favorable deposition conditions''. When the interaction is repulsive at larger distances, but attractive at shorter distances, deposition will still occur but it will be slowed down. One refers to ''unfavorable deposition conditions'' here. The initial stages of the deposition process can be described with the rate equation〔W. B. Russel, D. A. Saville, W. R. Schowalter,''Colloidal Dispersions'',Cambridge University Press, 1989.〕 : where Γ is the number density of deposited particles, ''t'' is the time, ''c'' the particle number concentration, and ''k'' the deposition rate coefficient. The rate coefficient depends on the flow velocity, flow geometry, and the interaction potential of the depositing particle with the substrate. In many situations, this potential can be approximated by a superposition of attractive van der Waals forces and repulsive electrical double layer forces and can be described by DLVO theory. When the charge of the particles is of the same sign as the substrate, deposition will be favorable at high salt levels, while it will be unfavorable at lower salt levels. When the charge of the particles is of the opposite sign as the substrate, deposition is favorable for all salt levels, and one observes a small enhancement of the deposition rate with decreasing salt level due to attractive electrostatic double layer forces. Initial stages of the deposition process are relatively similar to the early stages of particle heteroaggregation, whereby one of the particles is much larger than the other. 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Particle deposition」の詳細全文を読む スポンサード リンク
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